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Landing Technology: Achieving ultimate purity and breaking through to the future with semiconductor-grade aluminum sulfate innovation
Release time：
2025-05-22
In the semiconductor industry's pursuit of advanced processes and smaller nanometer nodes across various fields, the purity and stability of materials directly determine product performance and yield. As an indispensable key chemical in semiconductor material surface treatment, photoresist developer preparation, and wafer cleaning, etc. Semiconductor-grade aluminum sulfate (Aluminum Sulfate, Semiconductor Grade) boasts ultra-high purity and precise chemical properties, making it an "invisible guardian" in cleaning, etching, and polishing processes in advanced manufacturing.
China's chip manufacturing is accelerating towards high-end and independent development. As a leading domestic enterprise in high-end chemical products, Landeng Technology has been deeply engaged in the research and development and production of aluminum salts for more than ten years. It has previously developed and formulated product standards such as "battery-grade aluminum sulfate," laying a solid foundation for ultra-high purity semiconductor-grade aluminum sulfate, breaking foreign technology monopolies, helping China's "chip" breakthrough the blockade, and moving towards the world stage.
Landeng Technology has always adhered to the principle of "technology-based enterprise" to build a full industrial chain capability of "R&D, production, and testing".
● National-level laboratory: Equipped with equipment to perform processes such as "multiple recrystallization" and "supercritical fluid extraction" to ensure that the purity of semiconductor-grade aluminum sulfate products reaches ≥99.9999%, metal impurity content ≤5ppb, and particle size ≤0.1μm, comprehensively exceeding the SEMI C12 standard.
● 10,000-ton-level intelligent production line: Using a fully enclosed ultra-clean production space to achieve "zero pollution" and "high cleanliness" during production, with an annual output of tons.
Landeng Semiconductor-grade Aluminum Sulfate: Precisely Matches Advanced Process Needs
From 28nm mature processes to 3nm FinFET and GAA architectures, Landeng products empower the entire chip manufacturing process with superior performance:
1. Wafer Cleaning and Surface Activation
By customizing the pH value and ion concentration ratio, it efficiently removes metal residues and organic matter from the wafer surface, while forming a dense passivation layer, reducing the interface defect rate by more than 30%, and laying a perfect foundation for subsequent lithography and deposition processes.
2. Chemical Mechanical Planarization (CMP)
As a core additive in polishing solutions, it precisely controls the dispersibility and reactivity of alumina abrasives, achieving a wafer surface roughness of ≤0.2nm (Ra value), and supporting the global planarization needs of processes below 5nm.
3. Thin Film Deposition and Etching Assistance
In ALD (Atomic Layer Deposition) processes, Landeng high-purity aluminum sulfate can stably provide aluminum source ions, ensuring that the thin film thickness uniformity error is <±1%, significantly improving chip yield and reliability.
Go hand in hand with Landeng, and embark on the "core" journey together.
Driven by 5G, AI, and autonomous driving technologies, the semiconductor materials market is experiencing explosive growth. Landeng Technology will continue to increase R&D investment and strive to achieve the goal of being among the top three in the domestic market share of semiconductor-grade aluminum sulfate by 2025.
Choosing Landeng is not just choosing a product, but also choosing a responsibility and commitment to helping China's core rise!
Defining global standards with Chinese purity—Landeng Technology, letting the world see the hard power of Chinese materials!
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